PLUTO-2-TELCO-059寰峰湅HOLOEYE鍍呴檺鐩镐綅LCOS-SLM PLUTO-2-TELCO-059寰峰湅HOLOEYE鍍呴檺鐩镐綅LCOS-SLM PLUTO-2-TELCO-059寰峰湅HOLOEYE鍍呴檺鐩镐綅LCOS-SLM
寰峰湅HOLOEYE绌洪枔鍏夎(di脿o)鍒跺櫒锛岃灏勫厜瀛�(xu茅)鍏冧欢锛屽鏈夐渶瑕佽珛鑱�(li谩n)绯荤洓缍�(j墨ng)鐞�
鐢�(ch菐n)鍝佽矤(f霉)璨�(z茅)浜猴細鐩涚稉(j墨ng)鐞� 131,8972,4065
宸ヤ綔---Q:1483258941
寰峰湅HOLOEYE鐨勭┖闁撳厜瑾�(di脿o)鍒跺櫒锛圫LM锛夌郴绲�(t菕ng)鍩轰簬鍗婇€忔槑鎴栧弽灏勫紡娑叉櫠寰’绀哄櫒銆侶OLOEYE鐐烘尟骞呭拰鐩镐綅瑾�(di脿o)鍒舵彁渚涗簡寤ｆ硾鐨勭┖闁撳厜瑾�(di脿o)鍒跺櫒銆�
娑叉櫠绌洪枔鍏夎(di脿o)鍒跺櫒鐨勫厜瀛愭噳(y墨ng)鐢�
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Holoeye Photonics AG灏囨偍鐨勭郴绲�(t菕ng)鐭ヨ瓨闆嗘垚鍒拌嚜宸辩殑宸ヤ綔鍖呬腑锛屽皥娉ㄤ簬浠ュ競鍫寸偤灏�(d菐o)鍚�?q奴)宕縁(xi脿n)鎵€鐛插緱鐨勭煡璀樸€�
琛嶅皠鍏夊(xu茅)鍏冧欢
妯�(bi膩o)婧�(zh菙n)DOE锛堝鏂欙級
DOE Item # Specs Debion Design Wavel. a b c d 伪 尾 纬 未 Optimum Wavelength Range Image
DE-R 213 11 Lines, Square 635 nm* 76.7 mm 54.4 mm 5.4 mm 54.4 mm 42.0掳 30.4掳 3.0掳 30.4掳
DE-R 233 7 Lines, Square 635 nm* 54.0 mm 38.2 mm 6.4 mm 38.2 mm 30.2掳 21.6掳 3.6掳 21.6掳
DE-R 250 5 Lines (Rectangular) 660 nm* 55.0 mm 10.9 mm 2.7 mm 53.9 mm 30.8掳 6.2掳 1.6掳 30.2掳
DE-R 251 7 Lines (Rectangular) 650 nm 15.5 mm 9.0 mm 1.5 mm 12.6 mm 8.9掳 5.2掳 0.8掳 7.2掳
DE-R 252 5 Lines (Square) 635 nm* 42.7 mm 30.2 mm 7.5 mm 30.2 mm 24.1掳 17.2掳 4.3掳 17.2掳
DE-R 253 11 Lines (Square,
Thin Lines) 635 nm* 76.4 mm 54.0 mm 5.4 mm 54.0 mm 41.8掳 30.2掳 3.0掳 30.2掳 530 鈥� 670 nm
DE-R 254 25 Lines (Square) 660 nm* 68.4 mm 48.3 mm 2.0 mm 48.3 mm 37.7掳 27.2掳 1.1掳 27.2掳
DE-R 255 65 Lines (Square,
Central Line Thicker) 660 nm* 45.6 mm 32.2 mm 0.5 mm 32.2 mm 25.7掳 18.3掳 0.3掳 18.3掳 530 鈥� 670 nm
DE-R 284 41 Lines (Rectangular) 660 nm* 133.4 mm 104.0 mm 2.6 mm 78.0 mm 67.4掳 54.9掳 1.4掳
DE-R 348 10 Lines (Rectangular) 650 nm* 125.5 mm 90.0 mm 10.0 mm 87.5 mm 64.2掳 48.5掳 5.4掳
DE-R 350 15 Lines (Rectangular) 520 nm* 65.5 mm 42.1 mm 3.0 mm 50.2 mm 36.3掳 23.8掳 1.7掳
DE-R 381 11 Lines (Rectangular) 850 nm* 155.6 mm 41.5 mm 4.15 mm 150 mm 75.8掳 23.5掳 2.3掳
DE-R 386
DE-R 387
DE-R 391 81 Lines (Rectangular) 650 nm* 156.0 mm 128.8 mm 1.6 mm 93.6 mm 75.9掳 63.9掳 0.8掳
DE-R 392 3 Lines (Rectangular) 660 nm* 54.7 mm 10.8 mm 5.4 mm 53.6 mm 30.6掳 6.2掳 3.1掳 30.0掳
*Large-angle pattern that due to its symmetry properties is subject to geometrical distortion, if the DOE is used at laser wavelengths significantly different (螖位 > 50nm) from the design wavelength.
Lines & Dot Lines
Pattern Size @ 100 mm Distance (@ Design Wavelength) Pattern Angles (@ Design Wavelength)
DOE Item # Specs Debion Design Wavelength a b 伪 尾 Optimum Wavelength Range Image
DE-R 263 1:5 Dot Line 635 nm 10.5 mm 2.6 mm 6掳 1.5掳 450 鈥� 700 nm
DE-R 264 1:9 Dot Line 670 nm 1.6 mm 0.2 mm 0.9掳 0.1掳 630 鈥� 780 nm
DE-R 265 1:19 Dot Line 650 nm 24 mm 1.3 mm 13.7掳 0.8掳 500-540 nm; 630-690 nm
DE-R 266 QC-Line 鈥� 5@633 633 nm 8.7 mm 鈥� 5掳 鈥� 630 鈥� 690 nm
DE-R 267 QC-Line 鈥� 30@532 532 nm 53.8 mm 鈥� 30.1掳 鈥� 470 鈥� 560 nm
DE-R 281 1:11 Dot Line 650 nm 28.9 mm 2.9 mm 16.5掳 1.6掳 440-490 nm; 600-730 nm
DE-R 282 1:99 Dot Line 660 nm 33.7 mm 0.3 mm 19.1掳 0.2掳 600 鈥� 700 nm
DE-R 283 QC-Line 鈥� 20@633 633 nm 35.2 mm 鈥� 20掳 鈥� 630 鈥� 670 nm
DE-R 286 QC-Line 鈥� 30@660 660 nm 54.6 mm 鈥� 30.5掳 鈥� 600 鈥� 700 nm
DE-R 287 QC-Line 鈥� 45@660 660 nm 83.9 mm 鈥� 45.5掳 鈥� 600 鈥� 700 nm
DE-R 337 1:99 Dot Line 635 nm 49.3 mm 0.5 27.7掳 0.3掳 600 鈥� 700 nm
DE-R 364 QC-Line 鈥� 45@940 940 nm 83.0 mm 鈥� 45.0掳 鈥� 890 鈥� 980 nm
DE-R 369 QC-Line 鈥� 36@640 639 nm 65.0 mm 鈥� 36.0掳 鈥� 600 鈥� 700 nm
DE-R 383 QC-Line 鈥� 51@840 840 nm 95.0 mm 鈥� 50.6掳 鈥� 790 鈥� 880 nm
Crosshair
Pattern Size@ 100 mm Distance (@ Design Wavelength) Pattern Angles (@ Design Wavelength)
DOE Item # Specs Debion Design Wavelength a 伪 Optimum Wavelength Range Image
DE-R 205 Cross 鈥� 5@650 650 nm 8.7 mm 5掳 580 鈥� 660 nm
DE-R 212 Cross 鈥� 25@532 532 nm 45.1 mm 25.4掳 500 鈥� 640 nm
DE-R 214 Cross 鈥� 2@645 645 nm 3.4 mm 2.0掳 600 鈥� 645 nm
DE-R 218 Cross 鈥� 15@640 640 nm 26.3 mm 15.0掳 500 鈥� 640 nm
DE-R 239 Cross 鈥� 5@520 520 nm 8.7 mm 5.0掳 488 鈥� 600 nm
DE-R 245 Cross 鈥� 10@633 633 nm 17.5 mm 10.0掳 570 鈥� 690 nm
DE-R 246 Cross with surrounding
high contrast area -@633 633 nm 17.5 mm 10.0掳 530 鈥� 670 nm
DE-R 247 Cross 鈥� 25@645 645 nm 44.3 mm 25.0掳 600 鈥� 800 nm
DE-R 248 Cross 鈥� 37@645 645 nm 66.8 mm 37.0掳 630 鈥� 700 nm
DE-R 249 Cross 鈥� 45@633 633 nm 83.0 mm 45.0掳 500 鈥� 640 nm
DE-R 270 Cross 鈥� 30@640 640 nm 53.6 mm 30.0掳 580 鈥� 650 nm
DE-R 280 Cross 鈥� 60@635 635 nm 115.5 mm 60.0掳 580 鈥� 690 nm
DE-R 289 Cross 鈥� 15@520 520 nm 26.4 mm 15.0掳 480 鈥� 550 nm
DE-R 299 Cross 鈥� 75@650 650 nm 153.5 mm 75.0掳 600 鈥� 700 nm
DE-R 340 Cross 鈥� 60@450 450 nm 116.1 mm 60.3掳 420 鈥� 520 nm
DE-R 342 Cross 鈥� 52@515 515 nm 97.6 mm 52.0掳 440 鈥� 540 nm
DE-R 382 Cross 鈥� 30@450 450 nm 53.6 mm 30.0掳 440 鈥� 480 nm
Dot Matrix
Pattern Size @ 100 mm Distance (@ Design Wavelength) Pattern Angles (@ Design Wavelength)
DOE Item # Specs Debion Design Wavelength a b c d 伪 尾 纬 未 Optimum Wavelength Range Image
DE-R 206 17 x 17 Dots 660 nm 38.0 mm 26.6 mm 1.7 mm 26.6 mm 21.5掳 15.2掳 0.9掳 15.2掳
DE-R 223 2 x 2 + 1 Dots 635 nm 28.3 mm 19.9 mm 19.9 mm 19.9 mm 16.1掳 11.4掳 11.4掳 11.4掳
DE-R 231 101 x 101 Dots 660 nm 12.8 mm 9.1 mm 0.1 mm 9.1 mm 7.4掳 5.2掳 0.05掳 5.2掳
DE-R 241 21 x 21 Dots 635 nm 11.9 mm 8.4 mm 0.4 mm 8.4 mm 6.8掳 4.8掳 0.2掳 4.8掳
DE-R 242 16 x 16 Dots 635 nm 12.4 mm 8.8 mm 0.6 mm 8.8 mm 7.1掳 5.0掳 0.3掳 5.0掳
DE-R 243 17 x 17 Dots 635 nm 12.4 mm 8.8 mm 0.5 mm 8.8 mm 7.1掳 5.0掳 0.3掳 5.0掳
DE-R 244 13 x 13 Dots 635 nm 7.4 mm 5.3 mm 0.4 mm 5.3 mm 4.3掳 3.0掳 0.3掳 3.0掳
DE-R 257 51 x 51 Dots 660 nm* 56.9 mm 40.3 mm 0.8 mm 40.3 mm 31.8掳 22.8掳 0.5掳 22.8掳
DE-R 258 11 x 11 Dots 635 nm* 71.2 mm 50.3 mm 5.0 mm 50.3 mm 39.2掳 28.2掳 2.8掳 28.2掳
DE-R 339 6 x 6 Dots 635 nm 16.6 mm 11.7 mm 2.3 mm 11.7 mm 9.5掳 6.7掳 1.3掳 6.7掳 590 鈥� 690
DE-R 351 10 x 10 Dots 532 nm 21.1 mm 14.9 mm 3.3 mm 14.9 mm 23.8掳 17.0掳 1.9掳 17.0掳
DE-R 352 4 x 6 Dots 532 nm 26.6 mm 13.7 mm 4.6 mm 22.8 mm 15.1掳 7.8掳 2.6掳 13.6掳 500 鈥� 580
DE-R 353 5 x 5 Dots 690 nm 1.1 mm 0.75 mm 0.19 mm 0.75 mm 0.61掳 0.43掳 0.11掳 0.43掳 630 鈥� 750
DE-R 388 51 x 51 Dots 532 nm* 46.8 mm 33.1 mm 0.66 mm 33.1 mm 26.4掳 18.8掳 0.38掳 18.8掳
DE-R 389
21 x 21 Dots 520 nm* 46.8 mm 33.1 mm 1.66 mm 33.1 mm 26.4掳 18.8掳 0.95掳 18.8掳 480 鈥� 600 nm
*Large-angle pattern that due to its symmetry properties is subject to geometrical distortion, if the DOE is used at laser wavelengths significantly different (螖位 > 50nm) from the design wavelength.
Circles & Dot Circles
Pattern Size @ 100 mm Distance (@ Design Wavelength) Pattern Angles (@ Design Wavelength)
DOE Item # Specs Debion Design Wavelength a b 伪 尾 Optimum Wavelength Range Image
DE-R 219 Solid Line Circle 592 nm 55.8 mm 鈥� 31.2掳 鈥� 480 鈥� 600 nm
DE-R 220 1 : 16 Dot Circle 515 nm 81.9 mm 16.1 mm 44.5掳 9.2掳 480 鈥� 532 nm
DE-R 221 1:72 Dot Circle 532 nm 36.9 mm 1.6 mm 20.9掳 0.9掳 400 鈥� 570 nm
DE-R 229 1:36 Dot Circle 532 nm 6.1 mm 0.5 mm 3.5掳 0.3掳 480 鈥� 560 nm
DE-R 238 Solid Line Circle 520 nm 6.0 mm 鈥� 3.4掳 鈥� 520 鈥� 532 nm
DE-R 240 1:16 Dot Circle 635 nm 18.9 mm 3.7 mm 10.8掳 2.1掳 530 鈥� 700 nm
DE-R 268 Solid Line Circle 488 nm 77.0 mm 鈥� 42.1掳 鈥� 488 鈥� 532 nm
Random Dot Patterns
Random Dot Pattern Diffractive Optical Elements
Pattern Size @ 100 mm Distance (@ Design Wavelength) Pattern Angles (@ Design Wavelength)
DOE Item # Specs Debion Design Wavel. a b d 伪 尾 未 Optimum Wavelength Range Image
DE-R 332 33000-Dot Pseudo-Random 830 nm* 136.9 mm 114.6 mm 76.3 mm 68.8掳 59.6掳 41.7掳 820 鈥� 850
DE-R 335 33000-Dot Pseudo-Random 645 nm* 101.3 mm 84.8 mm 56.4 mm 53.7掳 45.9掳 31.5掳 630 鈥� 660
DE-R 372 40100-Dot Pseudo-Random 850 nm* 135.6 mm 114.9 mm 72.0 mm 68.3掳 59.7掳 39.6掳 825 鈥� 870
DE-R 373 31806-Dot Truely-Random 830 nm* 146.9 mm 118.5 mm 86.9 mm 72.6掳 61.3掳 47.0掳 800 鈥� 890
DE-R 374 47708-Dot Truely-Random 830 nm* 146.9 mm 118.5 mm 86.9 mm 72.6掳 61.3掳 47.0掳 800 鈥� 890
DE-R 375 29594-Dot Pseudo-Random 830 nm* 146.7 mm 118.5 mm 86.5 mm 72.5掳 61.3掳 46.8掳 810 鈥� 850
DE-R 384 51978-Dot Truely-Random 640 nm* 162.8 mm 97.5 mm 130.4 mm 78.3掳 52.0掳 66.2掳 610 鈥� 660
DE-R 385 101050-Dot Truely-Random 640 nm* 167.4 mm 100.4 mm 133.9 mm 79.9掳 53.3掳 67.6掳 610 鈥� 660
Viewfinder
DOE Item # Specs Debion Design Wavelength Pattern Size @ 100 mm Distance (@ Design Wavelength) Pattern Angles (@ Design Wavelength) Optimum Wavelength Range Image
DE-R 215 Viewfinder 645 nm Width: 27 mm
DE-R 234 Viewfinder (Lines Square) 633 nm* Width: 61 mm
DE-R 260 Viewfinder (Circle + Cross) 645 nm Width Cross: 37 mm
DE-R 261 Viewfinder (Dot Circle + Cross) 635 nm Width Cross: 11 mm
DE-R 262 Viewfinder (Dot Square) 532 nm Width: 12.3 mm
DE-R 288 Viewfinder 650 nm Width: 83.0 mm
DE-R 345
DE-R 394 Viewfinder 520 nm Width: 65.9 mm
DOE Item # Specs Debion Design Wavelength Pattern Size @ 100 mm Distance (@ Design Wavelength) Pattern Angles (@ Design Wavelength) Optimum Wavelength Range Image
DE-R 236 Solid Line Square 633 nm* Width: 60.2 mm
DE-R 256 Square Grid 51 x 51 Lines 660 nm Width: 39 mm
DE-R 259 5 Rings 645 nm Width: 51 mm
DE-R 269 10 Rings 515 nm Width: 96.2 mm
DE-R 285 Hexagon 780 nm Width: 13.1 mm Width: 7.5掳 520 鈥� 800 nm
DE-R 354 Square Grid 10脳10 Lines 658 nm Width: 72.8 mm
DE-R 396
DE-R 397
STANDARD DOE (GLASS) 妯�(bi膩o)婧�(zh菙n)DOE锛堢幓鐠冿級
DE 801
DE 802
DE 803
DE-R 440
DE 804
GAEA-2 1000钀儚绱犲儏闄愮浉浣峀COS-SLM锛堝弽灏勫紡锛�
Device Wavelength Range Fill Factor
GAEA-2-VIS-036 420 鈥� 650 nm 90 %
GAEA-2-NIR-069 650 鈥� 1100 nm 90 %
GAEA-2-TELCO-033 1400 鈥� 1700 nm 90 %
GAEA-2 4K LCOS SLM Kit
GAEA-2 LCOS-SLM
PLUTO-2 LCOS绌洪枔鍏夎(di脿o)鍒跺櫒鍍呯浉浣嶏紙鍙嶅皠锛�
PLUTO-2-UV-099 350 鈥� 420 nm 90 % 2.8 Pi @ 355 nm
PLUTO-2-VIS-014 420 鈥� 650 nm 65 % 3.9 Pi @ 530
PLUTO-2-VIS-016 420 鈥� 650 nm 67 % 6.7 Pi @ 530 nm
PLUTO-2-VIS-096 450 鈥� 650 nm 95-98 % 3.1 Pi @ 530 nm
PLUTO-2-NIR-011 420 鈥� 1100 nm 65-75 % 4.5 Pi @ 530 nm
PLUTO-2-NIR-015 650 鈥� 1100 nm 65-73 % 4.4 Pi @ 850 nm
PLUTO-2-NIR-080 730 鈥� 950 nm 95 % 4.8 Pi @ 800 nm
PLUTO-2-NIR-149 1000 鈥� 1100 nm 93 % 2.5 Pi @ 1064 nm
PLUTO-2-NIRO-023 1000 鈥� 1400 nm 74 % 4.1 Pi @ 1400 nm
PLUTO-2-TELCO-013 1400 鈥� 1700 nm 80 % 3.5 Pi @ 1550 nm
PLUTO-2-TELCO-059 1500 鈥� 1600 nm 90 % 2.9 Pi @ 1550 nm
PLUTO-2 Spatial Light Modulator Kit
PLUTO-2.1-UV-099 350 鈥� 500 nm 90 %
PLUTO-2.1-VIS-014 420 鈥� 650 nm 65 % 4.2 Pi @ 530
PLUTO-2.1-VIS-130 500 鈥� 670 nm 94 % (average) 3.2 Pi @ 530 nm
PLUTO-2.1-NIR-015 650 鈥� 1100 nm 65-73 % 5.4 Pi @ 800 nm
PLUTO-2.1-NIR-118 730 鈥� 950 nm 95 % 3.1 Pi @ 800 nm Dielectric Mirror, Higher Power Use
PLUTO-2.1-NIR-149 1000 鈥� 1100 nm 93 % 2.9 Pi @ 1064 nm Dielectric Mirror, Higher Power Use
PLUTO-2.1-NIRO-023 1000 鈥� 1400 nm 74 % 4.2 Pi @ 1300 nm
PLUTO-2.1-TELCO-013 1400 鈥� 1700 nm 80 % 3.9 Pi @ 1550 nm
PLUTO-2.1-TELCO-059 1500 鈥� 1600 nm 90 % 3.1 Pi @ 1550 nm Dielectric Mirror
LETO绱旂浉浣嶇┖闁撳厜瑾�(di脿o)鍒跺櫒锛堝弽灏勫紡锛�
LETO-VIS-009 420 鈥� 800 nm ~75 % 3.7 Pi @ 530 nm
LETO-VIS-017 420 鈥� 650 nm ~75 % min 2 Pi @ visible range
LETO-NIR-081 650 鈥� 1100 nm 62-70% 4.4 Pi @ 650 nm
LC 2012绌洪枔鍏夎(di脿o)鍒跺櫒锛堥€忓皠寮忥級
LC 2012
OPTIXPLORER鈥撳厜瀛�(xu茅)鏁欒偛濂椾欢
SLM杌熶欢
SLM鐔辩鐞嗙郴绲�(t菕ng)
TMS 001锛氬付棰�(f膿ng)鍐锋暎鐔卞櫒鐨勭啽绠＄悊绯荤当(t菕ng)
TMS 002锛氬付姘村喎鏁ｇ啽鍣ㄧ殑鐔辩鐞嗙郴绲�(t菕ng)
鍋滅敘(ch菐n)瑷�(sh猫)鍌�
LC-R 720锛孡C-R 1080锛孡C 2002锛孡C-R 2500锛孒EO 1080P锛孡C-R 768锛孡C-R 3000
寰’绀烘妧琛�(sh霉)
HED 6001鍠壊LCOS寰’绀哄櫒
HED 2200褰╄壊LCOS寰’绀哄櫒
HED 5216褰╄壊LCOS寰’绀哄櫒
HED 7200褰╄壊LCOS寰’绀哄櫒
HED 5201鍠壊LCOS寰’绀哄櫒
HED 1316褰╄壊LCOS寰’绀哄櫒
HED 1016褰╄壊娑叉櫠椤ず鍣�
HOLOEYE鐨勭┖闁撳厜瑾�(di脿o)鍒跺櫒锛圫LM锛夌郴绲�(t菕ng)鍩轰簬鍗婇€忔槑鎴栧弽灏勫紡娑叉櫠寰’绀哄櫒銆侶OLOEYE鐐烘尟骞呭拰鐩镐綅瑾�(di脿o)鍒舵彁渚涗簡寤ｆ硾鐨勭┖闁撳厜瑾�(di脿o)鍒跺櫒銆�
GAEA-2 1000钀儚绱犲儏闄愮浉浣峀COS-SLM锛堝弽灏勫紡锛�
